X-ray and EUV nanoscale imaging using compact laser plasma light sources and Fresnel optics
X-ray microscopy based on Fresnel optics is a powerful technique for nanoscale imaging of biological and inorganic materials. A spatial resolution below 10nm has been obtained. Application of X-ray microscopy to study nanoscale magnetism and its dynamics was demonstrated and EUV microscopy was used for mask inspection and defect detection. However, all these instruments are based on synchrotrons and their limited accessibility and high costs has driven the development of microscopes with the use of table-top X-ray and EUV sources.
In the project investigations on X-ray and EUV microscopy based on Fresnel optics will be performed using a compact laser plasma light source with a laser-irradiated gas puff target. Depending on the laser and the target parameters X-ray or EUV pulses can be generated efficiently without debris production. Grazing incidence axisymmetrical and multilayer off-axis optics will be used as X-ray and EUV collectors, respectively, and Fresnel zone plates for various wavelength ranges as imaging optics.
Mr. Alfio Torrisi received his bachelor’s degree in Applied Physics from Catania University, Italy, in 2013. During his University studies, he was involved in different researches in the field of the Cultural Heritage, using microanalysis techniques, such as SEM microscopy and SXR analysis. He joined the Institute of Optoelectronics (IOP), Military University of Warsaw, in September 2014 when he started working towards his PhD degree at the Extreme Ultraviolet and Soft X-ray Nanoimaging Laboratory, under the supervision of mjr dr hab. inz. Przemyslaw W. Wachulak.
The main research of the doctoral candidate concerns the development of the experimental desk-top microscopy systems, operating in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral range, achieving sub-100nm spatial resolution. The microscopes are based on a compact double stream gas puff target sources, in which the plasma is produced by irradiation of gaseous targets with nanosecond, high intensity laser pulses. The microscopes use reflective optics to focus the short wavelength radiation onto a sample and Fresnel zone plates to obtain magnified images of the sample with high spatial resolution. The goal of this research is to show the possibility to achieve high resolution imaging at low exposure times, with a compact short wavelength sources and small footprint of the entire system, which may, in the future, open a possibility for commercialization.