RAGAVA LOKASANI

Name: Ragava Lokasani
Home Institution: CTU
Host Institution: UCD
Cohort: 2013
Email: lokasaniraghu@gmail.com

Project Title

XUV spectra from plasma of second transition row elements generated by ns, ps and fs laser pulses

Abstract

Laser-produced plasmas are important sources of soft and hard X-rays suitable for a wide range of applications. In order to reach efficient laser energy conversion into XUV radiation, medium or highZ materials are used. While tin is the preferable source for XUV lithography in the spectral range of 13.5 nm, second row transition elements are very intense emitters in water window and in 6 nm range proposed for next generation XUV lithography.

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The project is aimed to study the basic characteristics of complex spectra of the 2nd row transition elements from targets irradiated by ns, ps, and fs lasers.

These spectra include vast number of neighboring transitions in various ionization stages. The measured spectra are interpreted theoretically via atomic Cowan code calculations which can also help to characterize plasma conditions. Emission spectra and laser energy transformation efficiency into a particular spectral range depend significantly on the complex processes during high-power laser interactions with targets. Suitable choice of target composition and of laser irradiation parameters may enable XUV source tailoring for particular applications.

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Biography

Ragava Lokasani completed a Master of Science from Stockholm University, Sweden. Mr.Lokasani has been working in semiconductor field for the past three years. He completed an internship at NXP, Nijmegen, working on Lead-free packaging, to assembly packages using lead free replacement materials and evaluating product quality both before and after reliability testing (MSL, TMCL and PPOT). Previously he had completed an Internship at a well-renowned nano-electronics research institute IMEC, on one of the key issues of EUV lithography: EUV photo-resist out-gassing.

He supported and demonstrated his proficiency in various domains in the field of optical lithography, provided high level of technical support and experience in operation, demonstration and installation of the EUV Lithography out gassing evaluation tool. Mr.Lokasani joined EXTATIC Erasmus Mundus Joint Doctorate program in October 2013 His current research area involves laser-plasma interaction experiments towards short-wavelength EUV and soft X-ray light sources using with ns ps and fs laser pulses.